Atomic Processes in Basic and Applied Physics
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- ISBN: 9783642255694
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Physical Description:
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electronic resource
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remote
XXI, 495 p. 226 illus., 50 illus. in color. online resource. - Publisher: Berlin, Heidelberg : Springer Berlin Heidelberg : Imprint: Springer, 2012.
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| Subject: | Physics Physics Atomic, Molecular, Optical and Plasma Physics Measurement Science and Instrumentation |
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Electronic resources
| LDR | 01644nam a22004095i 4500 | ||
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| 001 | 41143 | ||
| 003 | CONS | ||
| 005 | 20130726200305.0 | ||
| 007 | cr nn 008mamaa | ||
| 008 | 120530s2012 gw | s |||| 0|eng d | ||
| 020 | . | ‡a9783642255694 ‡9978-3-642-25569-4 | |
| 024 | 7 | . | ‡a10.1007/978-3-642-25569-4 ‡2doi |
| 035 | . | ‡a(DE-He213)978-3-642-25569-4 | |
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| 072 | 7. | ‡aSCI051000 ‡2bisacsh | |
| 100 | 1 | . | ‡aShevelko, Viacheslav. ‡eeditor. |
| 245 | 1 | 0. | ‡aAtomic Processes in Basic and Applied Physics ‡h[electronic resource] / ‡cedited by Viacheslav Shevelko, Hiro Tawara. |
| 264 | 1. | ‡aBerlin, Heidelberg : ‡bSpringer Berlin Heidelberg : ‡bImprint: Springer, ‡c2012. | |
| 300 | . | ‡aXXI, 495 p. 226 illus., 50 illus. in color. ‡bonline resource. | |
| 336 | . | ‡atext ‡btxt ‡2rdacontent | |
| 337 | . | ‡acomputer ‡bc ‡2rdamedia | |
| 338 | . | ‡aonline resource ‡bcr ‡2rdacarrier | |
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| 490 | 1 | . | ‡aSpringer Series on Atomic, Optical, and Plasma Physics, ‡x1615-5653 ; ‡v68 |
| 650 | 0. | ‡aPhysics. | |
| 650 | 1 | 4. | ‡aPhysics. |
| 650 | 2 | 4. | ‡aAtomic, Molecular, Optical and Plasma Physics. |
| 650 | 2 | 4. | ‡aMeasurement Science and Instrumentation. |
| 700 | 1 | . | ‡aTawara, Hiro. ‡eeditor. |
| 710 | 2 | . | ‡aSpringerLink (Online service) |
| 773 | 0 | . | ‡tSpringer eBooks |
| 776 | 0 | 8. | ‡iPrinted edition: ‡z9783642255687 |
| 830 | 0. | ‡aSpringer Series on Atomic, Optical, and Plasma Physics, ‡x1615-5653 ; ‡v68 | |
| 856 | 4 | 0. | ‡uhttp://biblioteca.ipicyt.edu.mx:2048/login?url=http://dx.doi.org/10.1007/978-3-642-25569-4 ‡yTexto completo ‡9CONS |
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